Tetramethylammonium hydroxide, 2.38% w/w aq. soln, Electronic Grade, 99.9999% (metals basis), Each
$ 94.80
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Details
Tetramethylammonium hydroxide is used as anisotropic etching of silicon, as a basic solvent in the development of acidic photo resist in the photolithography process, and is highly effective in stripping photo resist, and is used as a surfactant in the synthesis of ferrofluid, to inhibit nanoparticle aggregation.
Additional Information
| SKU | 10023804 |
|---|---|
| UOM | Each |
| UNSPSC | 12352302 |
| Manufacturer Part Number | 044940K2 |
| CAS Number | 75-59-2 |
| Is Hazardous | Yes |
| HS Code | 2923900000 |
|---|---|
| UN Number | UN 3286 |
| Proper Shipping Name | Tetramethylammonium hydroxide |
| Packaging Group | PG II |
| Commodity Code | 557 |
| DG or HZ | DG |
| Hazardous Class | 3 |
| Label |  |
| Molecular Formula | C4H13NO |
| EC Number | 200-882-9 |
| HIN | 80 |
| Hazard Statement | H226-H300+H310-H314-H331-H370-H372-H412 |
| Precautionary Statements | P264-P280-P301+P310-P305+P351+P338-P310-P260-P273-P302+P350-P301+P310+P330-P303+P361+P353-P304+P340+P310-P308+P311-P210-P301+P310a-P405-P501a-P260h |
| Risk Statements | 24/25-34-20/21/22-39/23/24/25-23/24/25-10-21/22-25-21-11-67-36-52-48/24-27/28-23-35-36/38 |
| GHS | GHS02,GHS05,GHS06,GHS08 |
| GHS (Pictogram) |     |
| Safety Statements | 45-36/37/39-26-16-36/37-28 |
| Hazard Code | C,T,F,T+,X |
| Signal Word | Danger |
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