Tetramethylammonium hydroxide, 25% w/w aq. soln, Each

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Tetramethylammonium hydroxide is used to produce tetramethyl-ammonium azide. It is used as an anisotropic etchant of silicon, as a basic solvent in the development of acidic photoresist in photolithography process, as a surfactant in the synthesis of ferrofluid and as a polarographic reagent. It finds application in the production of organic silicon, where it is used for computer silicon wafer surface brighteners and as a cleaning agent. It is also involved in the purification of some metallic elements.